We probe the electron attachment in hexafluoropropylene oxide (HFPO), C3F6O, a gas widely used in plasma technologies. We determine the absolute electron attachment cross section using two completely different experimental approaches: (i) a crossed-beam experiment at single collision conditions (local pressures of 5 × 10−4 mbar) and (ii) a pulsed Townsend experiment at pressures of 20–100 mbar. In the latter method, the cross sections are unfolded from the electron attach- ment rate coefficients. The cross sections derived independently by the two methods are in very good agreement. We additionally discuss the dissociative electron attachment fragmentation patterns and their role in the radical production in industrial HFPO plasmas.
Authors
- dr hab. Mateusz Zawadzki link open in new tab ,
- Alise Chachereau,
- dr Jaroslav Kočišek,
- Prof. Christian Franck,
- dr Juraj Fedor
Additional information
- DOI
- Digital Object Identifier link open in new tab 10.1063/1.5051724
- Category
- Publikacja w czasopiśmie
- Type
- artykuł w czasopiśmie wyróżnionym w JCR
- Language
- angielski
- Publication year
- 2018
