The paper reports controlled deposition of optically transparent and electrically conductive ITO films prepared by a combination of rf (13.56 MHz) and High Power Impulse Magnetron Sputtering (HiPIMS) systems without any post deposition thermal treatment/annealing. It is shown that (i) reactive admixture of N2 gas to the process and (ii) pressure in the deposition chamber enable to optimize optical properties of ITO films. Furthermore, the changes of electrical resistivity were observed, too. The variation of these ITO properties are attributed to change of crystalline structure measured by XRD methods.
Authors
- Vitezslav Stranak,
- dr hab. inż. Robert Bogdanowicz link open in new tab ,
- Petr Sezemsky,
- Harm Wulff,
- Angela Kruth,
- Mateusz Smietana,
- Jiri Kratochvil,
- Martin Cada,
- Zdenek Hubicka
Additional information
- DOI
- Digital Object Identifier link open in new tab 10.1016/j.surfcoat.2017.12.030
- Category
- Publikacja w czasopiśmie
- Type
- artykuł w czasopiśmie wyróżnionym w JCR
- Language
- angielski
- Publication year
- 2018
